Thermal stability of amorphous Nb/Si multilayers studied by x-ray reflection

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F99%3A00003503" target="_blank" >RIV/00216224:14310/99:00003503 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Thermal stability of amorphous Nb/Si multilayers studied by x-ray reflection

Original language description

The thermal stability was studied in temperature range from 150C up to 350C. It has been found, that interdifusion causes the interface shift without lost of interface sharpness. The diffusion model has been suggested that is based on enhanced diffusionof Si into Nb component of the multilayer.

Czech name

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Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BM - Solid-state physics and magnetism

OECD FORD branch

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Project

<a href="/en/project/GA202%2F98%2F0569" target="_blank" >GA202/98/0569: Thermal stability of layered systems studied by high resolution x-ray diffraction and optical reflection of x-rays in situ during annealing</a><br>

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year

1999

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Bulletin Krystalografické společnosti Materials Structure

ISSN

1211-5895

e-ISSN

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Volume of the periodical

6

Issue of the periodical within the volume

1

Country of publishing house

CZ - CZECH REPUBLIC

Number of pages

1

Pages from-to

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UT code for WoS article

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EID of the result in the Scopus database

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