Modification of the optical parameters of silicon thin films due to light scattering
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14410%2F02%3A00007015" target="_blank" >RIV/00216224:14410/02:00007015 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Modification of the optical parameters of silicon thin films due to light scattering
Original language description
Modification of the optical parameters of silicon thin films due to light scattering
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BM - Solid-state physics and magnetism
OECD FORD branch
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Result continuities
Project
<a href="/en/project/OC%20527.20" target="_blank" >OC 527.20: Plasmachemical depositions and plasmachemical treatment of surfaces of solid state substrate</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2002
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Journal of Non-Crystalline Solids
ISSN
0022-3093
e-ISSN
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Volume of the periodical
2002
Issue of the periodical within the volume
299-302
Country of publishing house
NL - THE KINGDOM OF THE NETHERLANDS
Number of pages
5
Pages from-to
299
UT code for WoS article
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EID of the result in the Scopus database
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