Deposition of Functional Plasma Polymers Influenced by Reactor Geometry in Capacitively Coupled Discharges

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14740%2F16%3A00093843" target="_blank" >RIV/00216224:14740/16:00093843 - isvavai.cz</a>

Result on the web

<a href="http://onlinelibrary.wiley.com/doi/10.1002/ppap.201500078/abstract;jsessionid=786281515922DCBB841ACC7AB907CF9C.f04t01?systemMessage=Pay+per+view+article+purchase%28PPV%29+on+Wiley+Online+Library+will+be+unavailable+on+Saturday+11th+March+from+05%3A00-14%" target="_blank" >http://onlinelibrary.wiley.com/doi/10.1002/ppap.201500078/abstract;jsessionid=786281515922DCBB841ACC7AB907CF9C.f04t01?systemMessage=Pay+per+view+article+purchase%28PPV%29+on+Wiley+Online+Library+will+be+unavailable+on+Saturday+11th+March+from+05%3A00-14%</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1002/ppap.201500078" target="_blank" >10.1002/ppap.201500078</a>

Result language

angličtina

Original language name

Deposition of Functional Plasma Polymers Influenced by Reactor Geometry in Capacitively Coupled Discharges

Original language description

The deposition of functional plasma polymers such as a-C:H:O films is mainly influenced by fragmentation of the parent molecules in the gas phase as well as by the energetic conditions during film growth at the surface. The influence of gas phase and surface processes on the a-C:H:O film properties was thus investigated in order to optimize cross-linking and functional group density. The control of both conditions enables permanent functional plasma polymer films deposited within different reactor geometries (capacitively coupled symmetric vs. asymmetric at driven electrode and at grounded electrode). Comparison and up-scaling of such plasma polymerization processes are facilitated by knowing the internal energy input into the plasma and into the growing film surface.

Czech name

—

Czech description

—

Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BL - Plasma physics and discharge through gases

OECD FORD branch

—

Project

<a href="/en/project/ED1.1.00%2F02.0068" target="_blank" >ED1.1.00/02.0068: Central european institute of technology</a><br>

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year

2016

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Plasma processes and polymers

ISSN

1612-8850

e-ISSN

—

Volume of the periodical

13

Issue of the periodical within the volume

2

Country of publishing house

DE - GERMANY

Number of pages

8

Pages from-to

279-286

UT code for WoS article

000370020100009

EID of the result in the Scopus database

—