Chalcogenide glass e-beam and photo-resists for ultrathin gray scale patterning
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216275%3A25310%2F09%3A00009579" target="_blank" >RIV/00216275:25310/09:00009579 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Chalcogenide glass e-beam and photo-resists for ultrathin gray scale patterning
Original language description
The advantages and applications of chalcogenide glass ChG thin film photoresists for grayscale lithography are demonstrated. It is shown that the ChG films can be used to make ultrathin 600 nm, high-resolution grayscale patterns, which can find their application, for example, in IR optics.
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
CA - Inorganic chemistry
OECD FORD branch
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Result continuities
Project
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Continuities
Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2009
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Journal of Micro/Nanolithography, MEMS, and MOEMS
ISSN
1932-5150
e-ISSN
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Volume of the periodical
8
Issue of the periodical within the volume
4
Country of publishing house
US - UNITED STATES
Number of pages
11
Pages from-to
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UT code for WoS article
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EID of the result in the Scopus database
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