Sputtering and pulsed laser deposition for near and mid-infrared applications: A comparative study of Ge25Sb10S65 and Ge25Sb10Se65 amorphous thin films.
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216275%3A25310%2F11%3A39892140" target="_blank" >RIV/00216275:25310/11:39892140 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.1111/j.1744-7402.2010.02571.x" target="_blank" >http://dx.doi.org/10.1111/j.1744-7402.2010.02571.x</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1111/j.1744-7402.2010.02571.x" target="_blank" >10.1111/j.1744-7402.2010.02571.x</a>
Alternative languages
Result language
angličtina
Original language name
Sputtering and pulsed laser deposition for near and mid-infrared applications: A comparative study of Ge25Sb10S65 and Ge25Sb10Se65 amorphous thin films.
Original language description
The deposition of Ge(25)Sb(10)S(65) and Ge(25)Sb(10)Se(65) amorphous chalcogenide thin films was performed by radio-frequency magnetron sputtering and pulsed laser deposition technique. The deposited layers were characterized by studying their morphology, topography, chemical composition, structure, and optical functions permitting a direct comparison of two deposition methods for obtaining attractive amorphous chalcogenide films. Reactive ion etching was then used to pattern rib/ridge waveguides in sulfide and selenide films with low surface roughness, vertical sidewalls, and reasonable etching rate. Optical losses of fabricated waveguides were measured at 1550 nm with values better than 1 dB/cm obtained for sulfide/selenide films deposited by both techniques.
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BH - Optics, masers and lasers
OECD FORD branch
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Result continuities
Project
<a href="/en/project/GA104%2F08%2F0229" target="_blank" >GA104/08/0229: Thin films deposited by pulsed lasers</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2011
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
International Journal of Applied Ceramic Technology
ISSN
1546-542X
e-ISSN
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Volume of the periodical
8
Issue of the periodical within the volume
5
Country of publishing house
GB - UNITED KINGDOM
Number of pages
11
Pages from-to
990-1000
UT code for WoS article
000297249200002
EID of the result in the Scopus database
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