Plasma diagnostics in pulsed laser deposition of GaLaS chalcogenides

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216275%3A25310%2F13%3A39896409" target="_blank" >RIV/00216275:25310/13:39896409 - isvavai.cz</a>
Result on the web
<a href="http://www.sciencedirect.com/science/article/pii/S0169433212020272" target="_blank" >http://www.sciencedirect.com/science/article/pii/S0169433212020272</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.apsusc.2012.11.069" target="_blank" >10.1016/j.apsusc.2012.11.069</a>

Result language
angličtina
Original language name
Plasma diagnostics in pulsed laser deposition of GaLaS chalcogenides
Original language description
The aim of this work is to characterize the ejection plume obtained by laser ablation of GaLaS (GLS) samples in order to better understand the ablation phenomena for optimizing the pulsed laser deposition of chalcogenide thin films. The dynamics of the plasma between target and substrate was investigated through time-and space-resolved optical emission spectroscopy. High-resolution optical spectra have been recorded in the UV-VIS range using a 500-mm focal length monochromator and a fast gate ICCD camera. From the space-time evolution of the optical signals, the velocities of various species (including neutrals and ions) have been derived. Using the relative intensity method, the space-and time-evolution of the excitation temperature and electronic density have been determined. A complex behavior of the laser ablation plasma has been revealed.
Czech name
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Czech description
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Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Project
<a href="/en/project/GAP106%2F11%2F0506" target="_blank" >GAP106/11/0506: Pulsed laser deposition of amorphous thin films</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year
2013
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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