Study of As50Se50 Thin Film Dissolution Kinetics in Amine based Solutions

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216275%3A25310%2F13%3A39897392" target="_blank" >RIV/00216275:25310/13:39897392 - isvavai.cz</a>
Result on the web
<a href="http://www.sciencedirect.com/science/article/pii/S1875389213002691#" target="_blank" >http://www.sciencedirect.com/science/article/pii/S1875389213002691#</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.phpro.2013.04.015" target="_blank" >10.1016/j.phpro.2013.04.015</a>

Result language
angličtina
Original language name
Study of As50Se50 Thin Film Dissolution Kinetics in Amine based Solutions
Original language description
Chalcogenide glass thin films are suitable materials for micro optical elements fabrication due to their convenient physical and chemical properties. They are generally photosensitive and thus can be selectively etched. Therefore they can be exploited asphotoresists in photolithography. In this paper we deal with the study of As50Se50 thin films dissolution kinetics in EDA based solutions. The detailed evolution of the etching curves is discussed and the dependences of the average etching rate on the composition and temperature of the etching bath are described.
Czech name
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Czech description
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Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
CA - Inorganic chemistry
OECD FORD branch
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Project
<a href="/en/project/GAP204%2F11%2F0832" target="_blank" >GAP204/11/0832: Fabrication of optical elements based on micro- and nanostructuring of chalcogenide layers</a><br>
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year
2013
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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