Tailoring of Multisource Deposition Conditions towards Required Chemical Composition of Thin Films
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216275%3A25310%2F22%3A39919361" target="_blank" >RIV/00216275:25310/22:39919361 - isvavai.cz</a>
Result on the web
<a href="https://www.mdpi.com/2079-4991/12/11/1830" target="_blank" >https://www.mdpi.com/2079-4991/12/11/1830</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.3390/nano12111830" target="_blank" >10.3390/nano12111830</a>
Alternative languages
Result language
angličtina
Original language name
Tailoring of Multisource Deposition Conditions towards Required Chemical Composition of Thin Films
Original language description
The model to tailor the required chemical composition of thin films fabricated via multisource deposition, exploiting basic physicochemical constants of source materials, is developed. The model is experimentally verified for the two-source depositions of chalcogenide thin films from Ga-Sb-Te system (tie-lines GaSb-GaTe and GaSb-Te). The thin films are deposited by radiofrequency magnetron sputtering using GaSb, GaTe, and Te targets. Prepared thin films are characterized by means of energy dispersive X-ray analysis coupled with a scanning electron microscope to determine the chemical composition and by variable angle spectroscopic ellipsometry to establish film thickness. Good agreement between results of calculations and experimentally determined compositions of the co-deposited thin films is achieved for both the above-mentioned tie-lines. Moreover, in spite of all the applied simplifications, the proposed model is robust to be generally used for studies where the influence of thin film composition on their properties is investigated.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
20506 - Coating and films
Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2022
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Nanomaterials
ISSN
2079-4991
e-ISSN
2079-4991
Volume of the periodical
12
Issue of the periodical within the volume
11
Country of publishing house
CH - SWITZERLAND
Number of pages
13
Pages from-to
1830
UT code for WoS article
000808741500001
EID of the result in the Scopus database
2-s2.0-85130815184