Deposition of Thin Films/Multilayers by IBAD

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26210%2F00%3A00000127" target="_blank" >RIV/00216305:26210/00:00000127 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Deposition of Thin Films/Multilayers by IBAD

Original language description

In the contribution the application of the ion assisted deposition method (IBAD) for deposition of thin films/multilayers of metals (Co, Ni, Ti, Zr, Mo, etc.) and nitrides and oxides of these metals will be disscused. The attention will be paid to the morphology, composition, structure, optical, electrical, and magnetic properties of these films, in particular as a funtction of the assisting ion beam energy and flux.

Czech name

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Czech description

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Type

D - Article in proceedings

CEP classification

JR - Other machinery industry

OECD FORD branch

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Project

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Continuities

Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year

2000

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection

Metal 2000

ISBN

80-85988-48-8

ISSN

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e-ISSN

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Number of pages

1

Pages from-to

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Publisher name

TANGER, s.r.o, Ostrava

Place of publication

Ostrava

Event location

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Event date

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Type of event by nationality

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UT code for WoS article

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