Deposition and in situ characterization of ultra-thin films
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26210%2F03%3APU41935" target="_blank" >RIV/00216305:26210/03:PU41935 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Deposition and in situ characterization of ultra-thin films
Original language description
Deposition of ultra-thin GaN layers and their analysis using XPS, SIMS, TOF-LEIS.
Czech name
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Czech description
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Classification
Type
D - Article in proceedings
CEP classification
BM - Solid-state physics and magnetism
OECD FORD branch
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Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2003
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Article name in the collection
EVC 03 Abstracts
ISBN
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ISSN
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e-ISSN
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Number of pages
2
Pages from-to
45-46
Publisher name
EVC
Place of publication
Berlin
Event location
Berlin
Event date
Jun 23, 2003
Type of event by nationality
EUR - Evropská akce
UT code for WoS article
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