Self-Healing Processes in Tantalum Capacitors
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26220%2F02%3APU27779" target="_blank" >RIV/00216305:26220/02:PU27779 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Self-Healing Processes in Tantalum Capacitors
Original language description
Self-healing processes in tantalum capacitors are investigated and their influence on the value of leakage current and noise parameters evaluated. The kinetic of this regenerative dielectric breakdown is discussed for samples with MnO2 and conducting polymer cathodes.
Czech name
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Czech description
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Classification
Type
D - Article in proceedings
CEP classification
JA - Electronics and optoelectronics
OECD FORD branch
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Result continuities
Project
<a href="/en/project/ME%20285" target="_blank" >ME 285: Development of Advanced Devices for Global Communication</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2002
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Article name in the collection
Proceedings of Student EEICT 2002
ISBN
80-214-2116-9
ISSN
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e-ISSN
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Number of pages
5
Pages from-to
239-243
Publisher name
FEKT VUT Brno
Place of publication
Brno
Event location
FEKT VUT Brno
Event date
Apr 25, 2002
Type of event by nationality
CST - Celostátní akce
UT code for WoS article
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