A New Possibility of Thick film Biosensor Substrate Properties Measurement
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26220%2F03%3APU40714" target="_blank" >RIV/00216305:26220/03:PU40714 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
A New Possibility of Thick film Biosensor Substrate Properties Measurement
Original language description
The aim of our work is to find effective way for study of TFT biosensors electrode substrates properties during biosensors fabrication, which is crucial question for the next development of this perspective technology. A new electrochemical analytical device was developed to ensure a defined mass transport to the electrodes, which is the most limiting process that influences the response quality of the sensor. The device consists of rotating conic vessel for measured sample and the thick film amperometrric sensor trenching in. This new electrochemical analytical solution was registered for patenting. The biosensors' substrate responses were tested on basic electrochemical couple of potassium ferrocyanide-ferricyanide. Thick film biosensor's substrate response dependence on the liquid velocity and geometrical arrangement is presented.
Czech name
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Czech description
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Classification
Type
D - Article in proceedings
CEP classification
CG - Electrochemistry
OECD FORD branch
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Result continuities
Project
<a href="/en/project/FD-K2%2F53" target="_blank" >FD-K2/53: The research of new methods of total toxicity analysis in food industry and the testing of new methods on pesticide toxicity analyser prototype.</a><br>
Continuities
Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2003
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Article name in the collection
Proceedings of IEEE Internacional Conference on Sensors 2003
ISBN
0-7803-8134-3
ISSN
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e-ISSN
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Number of pages
5
Pages from-to
656-660
Publisher name
IEEE
Place of publication
Toronto, Kanada
Event location
Toronto
Event date
Oct 22, 2003
Type of event by nationality
WRD - Celosvětová akce
UT code for WoS article
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