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RTS Noise in Submicron MOSFETs: Low and High Field Effects

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26220%2F05%3APU52191" target="_blank" >RIV/00216305:26220/05:PU52191 - isvavai.cz</a>

  • Result on the web

  • DOI - Digital Object Identifier

Alternative languages

  • Result language

    angličtina

  • Original language name

    RTS Noise in Submicron MOSFETs: Low and High Field Effects

  • Original language description

    RTS noise amplitude and capture and emission processes time constants are analysed as a function of gate and drain voltage / lateral electric field intensity in submicron MOSFETs

  • Czech name

    Šum RTS v submikronových MOSFETech: efekty nízké a vysoké intenzity pole

  • Czech description

    Amplituda RTS šumu a časové konstanty procesů zachycení a emise jsou analyzovány jako funkce napětí na hradle a na kanále, resp. intenzity příčného elektrického pole v submikronových MOSFETech

Classification

  • Type

    D - Article in proceedings

  • CEP classification

    JA - Electronics and optoelectronics

  • OECD FORD branch

Result continuities

  • Project

  • Continuities

    Z - Vyzkumny zamer (s odkazem do CEZ)

Others

  • Publication year

    2005

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Article name in the collection

    Proceedings of EDS'05 Electronic Devices and Systems IMAPS CS Int. Conf.

  • ISBN

    80-214-2990-9

  • ISSN

  • e-ISSN

  • Number of pages

    8

  • Pages from-to

  • Publisher name

    VUT

  • Place of publication

    Brno

  • Event location

    Brno

  • Event date

    Sep 15, 2005

  • Type of event by nationality

    CST - Celostátní akce

  • UT code for WoS article