Change of the thermal profile in the modern MCCB by the different electrical contact resistance

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26220%2F15%3APU115947" target="_blank" >RIV/00216305:26220/15:PU115947 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Change of the thermal profile in the modern MCCB by the different electrical contact resistance

Original language description

The paper deals with the change of temperature rise of the MCCB at the steady state. The critical parts under the study are main contacts and contact lever. The movable contact in focus is modern, rotoactive system which moves contact along a circular path and his material is harder than the fixed one. It causes sequential sag of the movable contact followed by a deformation of the fixed one. Consequently, the contact area between the pair of contacts is increasing, but the contact material is losing during the arc quenching. Rests and dirt layers appear on the contact surfaces and causes increase electric and thermal resistances between contacts. Temperature rise of the device with additive layers after arcing increases against new one at the steady state. The profile of the temperature rises are computed using finite volume method (FVM). The first part of the paper focuses on the calculation of the thermal losses of the electrical current path at rated current with the different elec

Czech name

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Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BJ - Thermodynamics

OECD FORD branch

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Project

Result was created during the realization of more than one project. More information in the Projects tab.

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year

2015

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Plasma Physics and Technology

ISSN

2336-2626

e-ISSN

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Volume of the periodical

2

Issue of the periodical within the volume

3

Country of publishing house

CZ - CZECH REPUBLIC

Number of pages

4

Pages from-to

77-81

UT code for WoS article

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EID of the result in the Scopus database

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