Continuous stiffness measurements of plasma-polymerized vinyltriethoxysilane films

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26310%2F06%3APU63326" target="_blank" >RIV/00216305:26310/06:PU63326 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Continuous stiffness measurements of plasma-polymerized vinyltriethoxysilane films

Original language description

A Nano Indenter XP (MTS Systems) was used to perform the indentation tests with a continuous stiffness measurement (CSM) technique and the depth profiles of Young's modulus and hardness to 20% of the film thickness were evaluated. A triangular pyramid (Berkovich) diamond indenter was employed for all experiments. Each sample was subjected to three load-unload cycles.

Czech name

Spojité měření tuhosti plazmových polymerů

Czech description

Zařízení Nano Indenter XP (MTS Systems) bylo využito pro nanoindentační měření.

Type

A - Audiovisual production

CEP classification

CF - Physical chemistry and theoretical chemistry

OECD FORD branch

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Project

<a href="/en/project/1P05OC087" target="_blank" >1P05OC087: Structuring of plasma polymers</a><br>

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year

2006

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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