Influence of oxygen on the chemical structure of plasma polymer films deposited from a mixture of tetravinylsilane and oxygen gas

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26310%2F07%3APU70622" target="_blank" >RIV/00216305:26310/07:PU70622 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Influence of oxygen on the chemical structure of plasma polymer films deposited from a mixture of tetravinylsilane and oxygen gas

Original language description

Tetravinylsilane was used to deposit hydrogenated amorphous silicon carbide (a-SiC:H) films with vinyl groups as functional species using an RF (13.56 MHz) pulsed plasma. Oxygen gas was mixed in tetravinylsilane in order to improve compatibility of a SiOC:H thin films with silicon dioxide component. The oxygen-to-total flowrate ratio and effective power were the only variable deposition parameters. Deposited films were analyzed by Rutherford Backscattering Spectrometry, Elastic Recoil Detection Analysis, and infrared spectroscopy in order to determine elemental composition and chemical structure of the plasma polymer. The chemical structure of films was correlated with plasma species monitored by mass spectroscopy during the deposition process and theresults clarified changes in chemical structure of films under influence of oxygen.

Czech name

Vliv kyslíku na chemickou strukturu vrstev plazmového polymeru deponovaného ze směsi tetravinylsilanu a kyslíku

Czech description

Vliv kyslíku na chemickou strukturu vrstev plazmového polymeru deponovaného ze směsi tetravinylsilanu a kyslíku

Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

CF - Physical chemistry and theoretical chemistry

OECD FORD branch

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Project

Result was created during the realization of more than one project. More information in the Projects tab.

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year

2007

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Plasma Processes and Polymers

ISSN

1612-8850

e-ISSN

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Volume of the periodical

4

Issue of the periodical within the volume

S1

Country of publishing house

DE - GERMANY

Number of pages

5

Pages from-to

776-780

UT code for WoS article

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EID of the result in the Scopus database

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