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Self-assembled monolayers of vinyltriethoxysilane and vinyltrichlorosilane

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26310%2F11%3APU96922" target="_blank" >RIV/00216305:26310/11:PU96922 - isvavai.cz</a>

  • Result on the web

  • DOI - Digital Object Identifier

Alternative languages

  • Result language

    angličtina

  • Original language name

    Self-assembled monolayers of vinyltriethoxysilane and vinyltrichlorosilane

  • Original language description

    Although a molecular monolayer is only a few nanometers thick, it can completely change the chemical and physical properties of a surface. Molecular monolayers can be readily prepared using chemisorptions on a variety of surfaces. The self-assembled monolayers (SAMs) are highly ordered two-dimensional structures that form spontaneously by the immersion of an appropriate substrate into a solution of an active surfactant in an organic solvent. The most common adsorbate/substrate combinations are alkylsilanes on oxide surfaces. Our study is aimed at SAM deposition using vinyltriethoxysilane (VTES) or vinyltrichlorosilane (VTCS) molecules chemisorbed on silicon oxide surfaces. The kinetics of formation of VTES or VTCS monolayers on planar glass substrate or silicon wafer with native silicon dioxide layer was characterized by contact angle measurements. The surface free energy and its components were evaluated using the Owens-Wendt-Kaelble geometric mean method and the Wu harmonic mean meth

  • Czech name

  • Czech description

Classification

  • Type

    O - Miscellaneous

  • CEP classification

    CF - Physical chemistry and theoretical chemistry

  • OECD FORD branch

Result continuities

  • Project

    Result was created during the realization of more than one project. More information in the Projects tab.

  • Continuities

    P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Others

  • Publication year

    2011

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů