Effects Of Different Cold Atmospheric‐Pressure Plasma Sources On The Yeast Candida Glabrata
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26310%2F23%3APU149586" target="_blank" >RIV/00216305:26310/23:PU149586 - isvavai.cz</a>
Result on the web
<a href="https://onlinelibrary.wiley.com/doi/epdf/10.1002/ppap.202300048" target="_blank" >https://onlinelibrary.wiley.com/doi/epdf/10.1002/ppap.202300048</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1002/ppap.202300048" target="_blank" >10.1002/ppap.202300048</a>
Alternative languages
Result language
angličtina
Original language name
Effects Of Different Cold Atmospheric‐Pressure Plasma Sources On The Yeast Candida Glabrata
Original language description
Four different cold plasma sources were directly applied onto a 24h inoculum of Candida glabrata inoculated on agar plates, within the limits of in vitro experiment. Their effects were compared and evaluated with respect to the size and stability of the inhibition zones formed in the posttreatment cultivation. The results prove significant inhibitory cold atmospheric-pressure plasma effects on the yeast C. glabrata. The overall inhibitory effects are directly proportional to the treatment time, the applied power, and the overall functioning of the plasma source and indirectly proportional to the initial cell concentration, although this factor was less significant compared to the other examined factors. The unipolar microwave torch was found to be the most effective in the inhibition of C. glabrata.
Czech name
—
Czech description
—
Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
—
OECD FORD branch
10606 - Microbiology
Result continuities
Project
—
Continuities
S - Specificky vyzkum na vysokych skolach
Others
Publication year
2023
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Plasma Processes and Polymers
ISSN
1612-8850
e-ISSN
1612-8869
Volume of the periodical
20
Issue of the periodical within the volume
12
Country of publishing house
DE - GERMANY
Number of pages
18
Pages from-to
1-18
UT code for WoS article
001005284200001
EID of the result in the Scopus database
2-s2.0-85163053166