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Methods of surface and thin film analysisof chemical composition, photoelectron diffraction

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26620%2F11%3APU97268" target="_blank" >RIV/00216305:26620/11:PU97268 - isvavai.cz</a>

  • Result on the web

  • DOI - Digital Object Identifier

Alternative languages

  • Result language

    čeština

  • Original language name

    Metody povrchové a tenkovrstvové analýzy prvkového složení (XPS, AES, SIMS), dirfrakce elektronů.

  • Original language description

    The goal of this article is to provide basic information on the physical principles and applications of the following mentioned methods. Chemical composition belongs to the basic characterization of materials used in many technological applications. X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES) are widely used for the investigation of chemical composition as well as of chemical state of solid surfaces. X-ray photoelectron diffraction (XPD) is a technique providing information on the detail crystallographic structure of single-crystal surfaces and epitaxial thin films of geometry of bonding ordered adsorbates. Secondary ion mass spectroscopy (SIMS) is more sensitive for measurement of low concentration species comparing tothe electron spectroscopy techniques and, in addition, it permits elemental and compositional depth profiling.

  • Czech name

    Metody povrchové a tenkovrstvové analýzy prvkového složení (XPS, AES, SIMS), dirfrakce elektronů.

  • Czech description

    The goal of this article is to provide basic information on the physical principles and applications of the following mentioned methods. Chemical composition belongs to the basic characterization of materials used in many technological applications. X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES) are widely used for the investigation of chemical composition as well as of chemical state of solid surfaces. X-ray photoelectron diffraction (XPD) is a technique providing information on the detail crystallographic structure of single-crystal surfaces and epitaxial thin films of geometry of bonding ordered adsorbates. Secondary ion mass spectroscopy (SIMS) is more sensitive for measurement of low concentration species comparing tothe electron spectroscopy techniques and, in addition, it permits elemental and compositional depth profiling.

Classification

  • Type

    J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

  • CEP classification

    BM - Solid-state physics and magnetism

  • OECD FORD branch

Result continuities

  • Project

    <a href="/en/project/LC06040" target="_blank" >LC06040: Structures for Nanophotonics and Nanoelectronics</a><br>

  • Continuities

    P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Others

  • Publication year

    2011

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Materials Structure

  • ISSN

    1211-5894

  • e-ISSN

  • Volume of the periodical

    2011

  • Issue of the periodical within the volume

    18

  • Country of publishing house

    CZ - CZECH REPUBLIC

  • Number of pages

    7

  • Pages from-to

    251-257

  • UT code for WoS article

  • EID of the result in the Scopus database