The growth of metastable fcc Fe78Ni22 thin films on H-Si(100) substrates suitable for focused ion beam direct magnetic patterning
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26620%2F19%3APU130900" target="_blank" >RIV/00216305:26620/19:PU130900 - isvavai.cz</a>
Result on the web
<a href="https://www.sciencedirect.com/science/article/pii/S0169433218330459?via%3Dihub" target="_blank" >https://www.sciencedirect.com/science/article/pii/S0169433218330459?via%3Dihub</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.apsusc.2018.10.263" target="_blank" >10.1016/j.apsusc.2018.10.263</a>
Alternative languages
Result language
angličtina
Original language name
The growth of metastable fcc Fe78Ni22 thin films on H-Si(100) substrates suitable for focused ion beam direct magnetic patterning
Original language description
We have studied the growth of metastable face-centered-cubic, non-magnetic Fe78Ni22 thin films on silicon substrates. These films undergo a magnetic (paramagnetic to ferromagnetic) and structural (fcc to bcc) phase transformation upon ion beam irradiation and thus can serve as a material for direct writing of magnetic nanostructures by the focused ion beam. So far, these films were prepared only on single-crystal Cu(1 0 0) substrates. We show that transformable Fe78Ni22 thin films can also be prepared on a hydrogen-terminated Si(1 0 0) with a 130-nm-thick Cu(1 0 0) buffer layer. The H-Si(1 0 0) substrates can be prepared by hydrofluoric acid etching or by annealing at 1200 degrees C followed by adsorption of atomic hydrogen. The Cu(1 0 0) buffer layer and Fe78Ni22 fcc metastable thin film were deposited by thermal evaporation in ultra-high vacuum. The films were consequently transformed in-situ by 4 keV Ar+ ion irradiation and ex-situ by a 30 keV Ga+ focused ion beam, and their magnetic properties were studied by magneto-optical Kerr effect magnetometry. The substitution of expensive copper single crystal substrate by standard silicon wafers dramatically expands application possibilities of metastable paramagnetic thin films for focused-ion-beam direct magnetic patterning.
Czech name
—
Czech description
—
Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
—
OECD FORD branch
10302 - Condensed matter physics (including formerly solid state physics, supercond.)
Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2019
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Applied Surface Science
ISSN
0169-4332
e-ISSN
1873-5584
Volume of the periodical
469
Issue of the periodical within the volume
1
Country of publishing house
NL - THE KINGDOM OF THE NETHERLANDS
Number of pages
6
Pages from-to
747-752
UT code for WoS article
000454617200086
EID of the result in the Scopus database
—