High-Capacitance Nanoporous Noble Metal Thin Films via Reduction of Sputtered Metal Oxides

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26620%2F22%3APU144249" target="_blank" >RIV/00216305:26620/22:PU144249 - isvavai.cz</a>
Result on the web
<a href="https://onlinelibrary.wiley.com/doi/10.1002/admi.202101973" target="_blank" >https://onlinelibrary.wiley.com/doi/10.1002/admi.202101973</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1002/admi.202101973" target="_blank" >10.1002/admi.202101973</a>

Result language
angličtina
Original language name
High-Capacitance Nanoporous Noble Metal Thin Films via Reduction of Sputtered Metal Oxides
Original language description
Increasing the electrochemical surface area of noble metal electrodes is vital for many applications, including catalysis and bioelectronics. Herein, a method is presented for obtaining porous noble metal thin films via reactive magnetron sputtering of noble metal oxides, MOx, followed by their reduction using chemical reducers or electrochemical current. Variation of reduction conditions yields a range of different electrochemical and morphological properties. This method for obtaining porous noble metals is rapid, facile, and compatible with microfabrication processes. The resulting metallic films are porous and have competitively high capacitance and low impedance.
Czech name
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Czech description
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Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
10405 - Electrochemistry (dry cells, batteries, fuel cells, corrosion metals, electrolysis)

Project
<a href="/en/project/LM2018110" target="_blank" >LM2018110: CzechNanoLab research infrastructure</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year
2022
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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