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Tailoring Tungsten Oxide Layers for Cold Field Emission Cathodes: Anodization and Thermal Oxidation Approaches

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26620%2F25%3APU156357" target="_blank" >RIV/00216305:26620/25:PU156357 - isvavai.cz</a>

  • Result on the web

    <a href="https://pubs.acs.org/doi/abs/10.1021/acsaelm.5c00241" target="_blank" >https://pubs.acs.org/doi/abs/10.1021/acsaelm.5c00241</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.1021/acsaelm.5c00241" target="_blank" >10.1021/acsaelm.5c00241</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    Tailoring Tungsten Oxide Layers for Cold Field Emission Cathodes: Anodization and Thermal Oxidation Approaches

  • Original language description

    This study explores the optimization of tungsten oxide layers formed via thermal oxidation and anodization for cold field emission applications. Surface modifications can enhance tungsten emitters by improving the emission stability and reducing ion-induced damage. Polycrystalline tungsten samples were treated using two oxidation methods: thermal oxidation (at 550-750 degrees C, 103-104 Pa) and anodization (in 0.33 mol/L H3PO4 at 5-35 V). Lower temperatures and pressures (550 degrees C, 103 Pa) produced smoother (R a similar to 23 nm) and uniform oxide layers (similar to 240 nm thick), improving the high-voltage stability (7.5-8.5 kV). Anodized layers, while less stable at high voltages, exhibited enhanced emission at lower operational voltages (similar to 5.5-7 kV). Field emission microscopy confirmed that thermally oxidized layers perform better under high electrostatic fields, whereas anodized layers offer a rapid response and lower threshold voltages. These findings demonstrate that both oxidation techniques are scalable and tunable for optimizing cold field emitters, with tailored properties suited to specific applications in electron microscopy and related technologies.

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database

  • CEP classification

  • OECD FORD branch

    20200 - Electrical engineering, Electronic engineering, Information engineering

Result continuities

  • Project

    <a href="/en/project/LM2018110" target="_blank" >LM2018110: CzechNanoLab research infrastructure</a><br>

  • Continuities

    P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>S - Specificky vyzkum na vysokych skolach

Others

  • Publication year

    2025

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    ACS Applied Electronic Materials

  • ISSN

    2637-6113

  • e-ISSN

  • Volume of the periodical

    6

  • Issue of the periodical within the volume

    3

  • Country of publishing house

    US - UNITED STATES

  • Number of pages

    12

  • Pages from-to

    „“-„“

  • UT code for WoS article

    001470607400001

  • EID of the result in the Scopus database

    2-s2.0-105002737645