Electron density and ion flux to the substrate in a Plasma Enhanced Chemical Vapor Deposition System excited by DC-Pulsed Plasma.
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F46747885%3A24210%2F00%3A00000076" target="_blank" >RIV/46747885:24210/00:00000076 - isvavai.cz</a>
Result on the web
—
DOI - Digital Object Identifier
—
Alternative languages
Result language
angličtina
Original language name
Electron density and ion flux to the substrate in a Plasma Enhanced Chemical Vapor Deposition System excited by DC-Pulsed Plasma.
Original language description
Plasma enhanced chemical vapour deposition (PECVD) has been used in many areas for deposition of coatings with special properties. To obtain some insights how the internal plasma parameters significant for film
Czech name
—
Czech description
—
Classification
Type
D - Article in proceedings
CEP classification
JK - Corrosion and material surfaces
OECD FORD branch
—
Result continuities
Project
—
Continuities
Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2000
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Article name in the collection
7th international conference on plasma surface engineering
ISBN
—
ISSN
—
e-ISSN
—
Number of pages
1
Pages from-to
—
Publisher name
Deutsche Gesellschaft fur Galvano- und Oberfachentechnik e.V. Horionplatz 6 D-40213 Dusseldorf, Germany
Place of publication
Dusseldorf
Event location
—
Event date
—
Type of event by nationality
—
UT code for WoS article
—