Optical diagnostic as a simple and cheap tool for process control

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F46747885%3A24210%2F02%3A24210031" target="_blank" >RIV/46747885:24210/02:24210031 - isvavai.cz</a>
Result on the web
—
DOI - Digital Object Identifier
—

Result language
angličtina
Original language name
Optical diagnostic as a simple and cheap tool for process control
Original language description
The application of OES as a tool of analyses of an industrial plan operation conditions has been presented. For control of plasma processes reduction of data produced from OES is necessary. Chromatic monitoring has been proposed as a method for data reduction. Based on The chromatic modulation was successfully used for detection of gas composition changes in the nitrogen/hydrogen mixture, end-point detection during plasma etching in oxygen plasma. An investigation of the sensitivity limit of gas monitoring for process control in a down-stream microwave plasma will be presented. A low-cost robust spectrometer for industrial process control will be introduced. Some results of its operation in control of plasma process were presented.
Czech name
—
Czech description
—

Publication year
2002
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection
3rd European Advanced Equipment Control /Advanced Process Control Conference
ISBN
—
ISSN
—
e-ISSN
—
Number of pages
1
Pages from-to
117
Publisher name
Technologie Zentrum Dresden GmbH
Place of publication
Dresden, Německo
Event location
Dresden, Německo
Event date
Jan 1, 2002
Type of event by nationality
EUR - Evropská akce
UT code for WoS article
—

Similar results(10)