Model Calculations of Electric Forces Acting on Carbon Nanotube Tip in DC-Plasma Sheath.
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F46747885%3A24210%2F04%3A24210155" target="_blank" >RIV/46747885:24210/04:24210155 - isvavai.cz</a>
Alternative codes found
RIV/60076658:12410/04:00005217
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Model Calculations of Electric Forces Acting on Carbon Nanotube Tip in DC-Plasma Sheath.
Original language description
Numerous experimental investigations indicate the necessity of negative bias for low-pressure CVD of aligned carbon nanotubes. Based on the experimentally determined electron density in the dual hot filament/DC plasma deposition system the electrical fild close to the substrate was calculated. Taking into account the field enhancement in the vicinity of the CNTs the force acting on their tips is determined. The calculated force has been found to exceed the weight of the droplet by four orders of magnitde. The computations have shown only a weak dependence between the electrical forces and the droplet shape.
Czech name
Modelové výpočty elektrických sil působících na šličku uhlíkové nanotrubičky v stejnosměrné plazmě.
Czech description
Početné experimentální zkoušky ukazují na nezbytnost biasu pro nízkotlaké CVD vyrovnané uhlíkové nasnotrubičky. Na základě experimentálně určené husrtoty elektronů v duálním depozičním systému žhavé vlákno/ stejnosměrná plazma bylo vypočteno elektrické ple přilehlé k substrátu.
Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Result continuities
Project
<a href="/en/project/OC%20527.60" target="_blank" >OC 527.60: Investigation of the influence of the discharge excitation type on the properties of the deposited films</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2004
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Diamond & Related Materials
ISSN
0925-9635
e-ISSN
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Volume of the periodical
13(2004)3
Issue of the periodical within the volume
2004
Country of publishing house
NL - THE KINGDOM OF THE NETHERLANDS
Number of pages
4
Pages from-to
503-506
UT code for WoS article
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EID of the result in the Scopus database
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