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Model Calculations of Electric Forces Acting on Carbon Nanotube Tip in DC-Plasma Sheath.

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F46747885%3A24210%2F04%3A24210155" target="_blank" >RIV/46747885:24210/04:24210155 - isvavai.cz</a>

  • Alternative codes found

    RIV/60076658:12410/04:00005217

  • Result on the web

  • DOI - Digital Object Identifier

Alternative languages

  • Result language

    angličtina

  • Original language name

    Model Calculations of Electric Forces Acting on Carbon Nanotube Tip in DC-Plasma Sheath.

  • Original language description

    Numerous experimental investigations indicate the necessity of negative bias for low-pressure CVD of aligned carbon nanotubes. Based on the experimentally determined electron density in the dual hot filament/DC plasma deposition system the electrical fild close to the substrate was calculated. Taking into account the field enhancement in the vicinity of the CNTs the force acting on their tips is determined. The calculated force has been found to exceed the weight of the droplet by four orders of magnitde. The computations have shown only a weak dependence between the electrical forces and the droplet shape.

  • Czech name

    Modelové výpočty elektrických sil působících na šličku uhlíkové nanotrubičky v stejnosměrné plazmě.

  • Czech description

    Početné experimentální zkoušky ukazují na nezbytnost biasu pro nízkotlaké CVD vyrovnané uhlíkové nasnotrubičky. Na základě experimentálně určené husrtoty elektronů v duálním depozičním systému žhavé vlákno/ stejnosměrná plazma bylo vypočteno elektrické ple přilehlé k substrátu.

Classification

  • Type

    J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

  • CEP classification

    BL - Plasma physics and discharge through gases

  • OECD FORD branch

Result continuities

  • Project

    <a href="/en/project/OC%20527.60" target="_blank" >OC 527.60: Investigation of the influence of the discharge excitation type on the properties of the deposited films</a><br>

  • Continuities

    P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Others

  • Publication year

    2004

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Diamond & Related Materials

  • ISSN

    0925-9635

  • e-ISSN

  • Volume of the periodical

    13(2004)3

  • Issue of the periodical within the volume

    2004

  • Country of publishing house

    NL - THE KINGDOM OF THE NETHERLANDS

  • Number of pages

    4

  • Pages from-to

    503-506

  • UT code for WoS article

  • EID of the result in the Scopus database