Reactive Magnetron Sputtering of AlN Hard Films and Tribological Properties

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F46747885%3A24620%2F16%3A00000439" target="_blank" >RIV/46747885:24620/16:00000439 - isvavai.cz</a>
Result on the web
<a href="http://techsys.tu-plovdiv.bg/en/" target="_blank" >http://techsys.tu-plovdiv.bg/en/</a>
DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Reactive Magnetron Sputtering of AlN Hard Films and Tribological Properties
Original language description
Aluminum nitride (AlN) films were grown on steel and Si (100) substrates by DC magnetron sputtering in plasma containing a mixture of argon and nitrogen, using a pure aluminum target. From the measurement of nanomechanical properties of AlN thin films, the higher hardness of 28 GPa and elastic modulus of 437 GPa are obtained. The surface topography of 2 µm thick AlN was investigated by atomic force microscopy (AFM) in contact mode and an average surface roughness of 640nm was obtained.Wear testing was done using a CETR UMI Multi-Specimen Test System in ball-on-disc mode at the room temperature. Evaluation of the friction coefficient and the wear rate of coatings and balls were determined. ISO 683/XIII-74 bearing steel with a diameter of 6.35 mm was used as counter-part. The calculated wear rate of the AlN coating is 1.22x10-3 mm3N-1m-1and the coefficient of friction is 0.3.
Czech name
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Czech description
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Project
<a href="/en/project/LO1201" target="_blank" >LO1201: DEVELOPMENT OF THE INSTITUTE FOR NANOMATERIALS, ADVANCED TECHNOLOGIES AND INNOVATION</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year
2016
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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