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The ITO thin films deposited by magnetron sputtering for solar cell applications

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F46747885%3A24620%2F24%3A00012493" target="_blank" >RIV/46747885:24620/24:00012493 - isvavai.cz</a>

  • Result on the web

    <a href="https://journals.pan.pl/dlibra/publication/150803/edition/131949/content" target="_blank" >https://journals.pan.pl/dlibra/publication/150803/edition/131949/content</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.24425/bpasts.2024.150803" target="_blank" >10.24425/bpasts.2024.150803</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    The ITO thin films deposited by magnetron sputtering for solar cell applications

  • Original language description

    The paper presents the results of research on the surface topography and electrical properties of ITO thin films deposited by PVD for applications in silicon photovoltaic cells. The surface condition and chemical composition were characterized using a scanning electron microscope and the thickness and optical constants were measured using a spectroscopic ellipsometer. To compare the impact of the preparation process on the properties of layers, deposition was carried out with three different temperatures: 25, 200 and 400°C. As the temperature increased, the surface roughness changed, which correlated with the results of structural tests. The crystallite size increased from 11 to 46 nm. This, in turn, reduced the surface resistance. The electrical properties were measured using a four-point probe method and then the prepared solar cells containing ITO thin films in their structure were examined. By controlling the deposition parameters, the surface resistance of the deposited layer and the efficiency of the prepared solar cells (18.91%) were optimized. Currently, ITO has the best properties for use in optoelectronics and photovoltaics in among the known TCO layers. The magnetron sputtering method is widely used in many industries. Therefore, the authors predict that TCO layers can replace currently used antireflection layers and reduce the numberand dimensions of front metal contacts in solar cells.

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database

  • CEP classification

  • OECD FORD branch

    21100 - Other engineering and technologies

Result continuities

  • Project

  • Continuities

    I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Others

  • Publication year

    2024

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    BULLETIN OF THE POLISH ACADEMY OF SCIENCES-TECHNICAL SCIENCES

  • ISSN

    0239-7528

  • e-ISSN

  • Volume of the periodical

    72

  • Issue of the periodical within the volume

    5

  • Country of publishing house

    PL - POLAND

  • Number of pages

    9

  • Pages from-to

  • UT code for WoS article

    001410612000008

  • EID of the result in the Scopus database

    2-s2.0-85204771785