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SU-8 microchannels for live cell dielectrophoresis improvements

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23220%2F15%3A43925715" target="_blank" >RIV/49777513:23220/15:43925715 - isvavai.cz</a>

  • Alternative codes found

    RIV/49777513:23520/15:43925715

  • Result on the web

    <a href="http://dx.doi.org/10.1109/DTIP.2015.7160971" target="_blank" >http://dx.doi.org/10.1109/DTIP.2015.7160971</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.1109/DTIP.2015.7160971" target="_blank" >10.1109/DTIP.2015.7160971</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    SU-8 microchannels for live cell dielectrophoresis improvements

  • Original language description

    In this work a novel SU-8 fabrication technology is employed to construct microfluidic devices for sensitive dielectrophoretic (DEP) manipulation of budding yeast cells. Identical devices were produced with standard soft-lithography processes. In comparison to standard PDMS based soft-lithography, an SU- 8 layer was used to construct the microchannel walls sealed by a flat sheet of PDMS to obtain the microfluidic channels. Direct bonding of PDMS to SU-8 surface was achieved by efficient wet chemical silanization combined with oxygen plasma treatment of the contact surface. The presented fabrication process significantly improved the alignment of the microstructures. In addition, PDMS delamination above electrode topologies was significantly decreased over standard soft-lithography devices. The fabrication time and costs of the proposed methodology were found to be roughly the same. Sensitivity of the devices was tested by discriminating Saccharomyces cerevisiae cells in the G1 phase from cells in the S/G2/M phase using dielectrophoresis. This level of sensitivity necessitated high precision electrode structure that was designed using an FEM model based approach. Attaining such high precision using standard soft-lithography can be difficult due to additional requirements of an alignment stage and its associated tight timing limits.

  • Czech name

  • Czech description

Classification

  • Type

    D - Article in proceedings

  • CEP classification

  • OECD FORD branch

    20205 - Automation and control systems

Result continuities

  • Project

    <a href="/en/project/ED1.1.00%2F02.0090" target="_blank" >ED1.1.00/02.0090: NTIS - New Technologies for Information Society</a><br>

  • Continuities

    P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>S - Specificky vyzkum na vysokych skolach

Others

  • Publication year

    2015

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Article name in the collection

    Symposium on Design, Test, Integration &amp; Packaging of MEMS/MOEMS (DTIP)

  • ISBN

    978-1-4799-8625-5

  • ISSN

  • e-ISSN

  • Number of pages

    4

  • Pages from-to

    42-45

  • Publisher name

    IEEE

  • Place of publication

    Montpellier

  • Event location

    Montpellier, France

  • Event date

    May 27, 2015

  • Type of event by nationality

    WRD - Celosvětová akce

  • UT code for WoS article

    000380516700010