Electrical resistivity of Cu films sputtered by pulsed dc magnetron
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F03%3A00000106" target="_blank" >RIV/49777513:23520/03:00000106 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Electrical resistivity of Cu films sputtered by pulsed dc magnetron
Original language description
The experimental device consists of a stainless steel vacuum chamber with a planar circular unbalanced magnetron with a target 100 mm of Cu in diameter which is supplied by a pulsed dc power supply Rubig MP-120 with maximum pulse voltage 1000 V, the maximum pulse current 120 A, the maximum pulse power 120 kW and the average power 50 kW. The repetition frequency can be varied between 0.5 and 50 kHz.
Czech name
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Czech description
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Classification
Type
D - Article in proceedings
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Result continuities
Project
<a href="/en/project/ME%20203" target="_blank" >ME 203: New plasma systems for preparation of thin films</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2003
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Article name in the collection
Proceedings of the XIVth Symposium on Application of Plasma Processes
ISBN
8080401950
ISSN
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e-ISSN
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Number of pages
2
Pages from-to
122-123
Publisher name
Military Academy
Place of publication
Liptovský Mikuláš
Event location
Liptovský Mikuláš
Event date
Jan 13, 2003
Type of event by nationality
WRD - Celosvětová akce
UT code for WoS article
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