Hard Si-B-C-N films prepared by reactive magnetron sputtering

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F13%3A43918897" target="_blank" >RIV/49777513:23520/13:43918897 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Hard Si-B-C-N films prepared by reactive magnetron sputtering

Original language description

The ternary and quaternary materials containing Si, B, C and N have been attracting great interest due to their new features which can be used in microelectronics and coating technologies. The paper deals with influence of various deposition parameters on mechanical properties of these films.

Czech name

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Czech description

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Type

O - Miscellaneous

CEP classification

BL - Plasma physics and discharge through gases

OECD FORD branch

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Project

<a href="/en/project/GP106%2F02%2FD096" target="_blank" >GP106/02/D096: Mechanical properties of Si-B-C-N films formed by reactive magnetron sputtering</a><br>

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year

2013

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů