Dependence of structure and properties of hard nanocrystalline conductive films MBCN (M = Ti, Zr, Hf) on the choice of metal element
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F15%3A43925301" target="_blank" >RIV/49777513:23520/15:43925301 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.1016/j.tsf.2015.04.023" target="_blank" >http://dx.doi.org/10.1016/j.tsf.2015.04.023</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.tsf.2015.04.023" target="_blank" >10.1016/j.tsf.2015.04.023</a>
Alternative languages
Result language
angličtina
Original language name
Dependence of structure and properties of hard nanocrystalline conductive films MBCN (M = Ti, Zr, Hf) on the choice of metal element
Original language description
The paper deals with hard nanocrystalline conductive films MBCN (M = Ti, Zr, Hf) prepared by pulsed dc reactive magnetron sputtering. We focus on the effect of the choice of metal element on materials structure and properties. We find that the transitionfrom Ti through Zr to Hf leads to an increasing preference to form stable MBxCyN1-x-y solid solutions. These results are compared with and explained by ab-initio calculations. At a low N content the transition from X-ray amorphous TiBCN to truly nanocrystalline or even nanocomposite ZrBCN and HfBCN leads to increased hardness, increased H/E ratio and increased elastic recovery. At a medium N content the transition from TiBCN (which is homogenous) to ZrBCN and HfBCN (where small conductive nanocrystalsare separated by an insulating amorphous phase) dramatically increases the electrical resistivity.
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Result continuities
Project
<a href="/en/project/GJ15-00859Y" target="_blank" >GJ15-00859Y: Design of new functional materials, and pathways for their atom-by-atom preparation, using advanced computer modelling</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2015
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Thin Solid Films
ISSN
0040-6090
e-ISSN
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Volume of the periodical
2015
Issue of the periodical within the volume
586
Country of publishing house
NL - THE KINGDOM OF THE NETHERLANDS
Number of pages
6
Pages from-to
22-27
UT code for WoS article
000353984000004
EID of the result in the Scopus database
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