16th International Conference on Reactive Sputter Deposition (RSD 2017)

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F17%3A43949774" target="_blank" >RIV/49777513:23520/17:43949774 - isvavai.cz</a>
Result on the web
<a href="http://rsd2017.zcu.cz/program/.content/Program_Abstracts_RSD2017.pdf" target="_blank" >http://rsd2017.zcu.cz/program/.content/Program_Abstracts_RSD2017.pdf</a>
DOI - Digital Object Identifier
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Result language
angličtina
Original language name
16th International Conference on Reactive Sputter Deposition (RSD 2017)
Original language description
The International Conference on Reactive Sputter Deposition (RSD) was established by the DRAFT research group at the Ghent University in 2000. Since the beginning the conference has provided a platform among leading international scientists, engineers and students for a discussion of recent achievements in reactive sputter deposition. The conference has developed over time to an annual tradition, steadily growing without losing its focus on reactive sputtering and its fundamental aspects. The 16th International Conference on Reactive Sputter Deposition is focused on the following topics related to reactive sputter deposition: A. Plasma processes, plasma–surface interactions and thin film growth; B. Films with controlled microstructure and functional properties; C. Advanced protective coatings; D. Applied research and industrial applications.
Czech name
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Czech description
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Project
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Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year
2017
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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