Effect of energy on macrostress in Ti(Al,V)N films prepared by magnetron sputtering
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F18%3A43952053" target="_blank" >RIV/49777513:23520/18:43952053 - isvavai.cz</a>
Result on the web
<a href="https://doi.org/10.1016/j.vacuum.2018.09.038" target="_blank" >https://doi.org/10.1016/j.vacuum.2018.09.038</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.vacuum.2018.09.038" target="_blank" >10.1016/j.vacuum.2018.09.038</a>
Alternative languages
Result language
angličtina
Original language name
Effect of energy on macrostress in Ti(Al,V)N films prepared by magnetron sputtering
Original language description
The article reports on the effect of the energy delivered into the growing film on its macrostress, microstructure, mechanical properties and resistance to cracking of Ti(Al,V)N films. The Ti(Al,V)N films were deposited on Si(111) and Mo substrates by magnetron sputtering in a mixture Ar+N2 gases using a dual magnetron with closed magnetic field and equipped with TiAlV (6 at.% Al, 4 at.% V) alloy targets. It is shown that the compressive macrostress in sputtered films can be reduced either by the pulsed bipolar bias voltage with alternating negative and positive pulses or the electron and ion bombardment during overshoots in the pulsed magnetron sputtering. All sputtered films with high ratio H/E* > 0.1, compressive macrostress, and non-columnar microstructure exhibit an enhanced resistance to cracking. The high compressive macrostress in the film is not the necessary condition for the formation of the films with an enhanced resistance to cracking.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
20506 - Coating and films
Result continuities
Project
<a href="/en/project/LO1506" target="_blank" >LO1506: Sustainability support of the centre NTIS - New Technologies for the Information Society</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2018
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Vacuum
ISSN
0042-207X
e-ISSN
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Volume of the periodical
158
Issue of the periodical within the volume
DEC 2018
Country of publishing house
GB - UNITED KINGDOM
Number of pages
8
Pages from-to
52-59
UT code for WoS article
000449897400009
EID of the result in the Scopus database
2-s2.0-85053814674