Distribution of O atoms on partially oxidized metal targets, and the consequences for reactive sputtering of individual metal oxides
Result description
We investigate the oxidation of a wide range of metal surfaces by ab-initio calculations. We go through a wide range of metals (Sc, Y, La, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Cu, Ag, Au, Zn, Cd, Al) and surface oxygen coverages (Ɵo). Calculations of the adsorption energy per O atom (Eads_min) are followed by characterizing the preferred distribution of O atoms on a partially oxidized surface. We find that individual metals exhibit different Eads_min(Ɵo) dependencies and thermodynamical preferences: (i) decreasing Eads_min(Ɵo) and heterogeneous distribution of O atoms (stoichiometric oxide + metal), (ii) increasing Eads_min(Ɵo) and homogeneous distribution of O atoms (substoichiometric oxide), (iii) concave Eads_min(Ɵo), etc. This is of crucial importance for the quantities such as secondary electron emission yield. We demonstrate use of these results by presenting static and dynamic Monte Carlo simulations of sputtering.
Keywords
Ab-initio calculationsReactive sputteringTarget poisoningAdsorption energyOxidation
The result's identifiers
Result code in IS VaVaI
Result on the web
DOI - Digital Object Identifier
Alternative languages
Result language
angličtina
Original language name
Distribution of O atoms on partially oxidized metal targets, and the consequences for reactive sputtering of individual metal oxides
Original language description
We investigate the oxidation of a wide range of metal surfaces by ab-initio calculations. We go through a wide range of metals (Sc, Y, La, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Cu, Ag, Au, Zn, Cd, Al) and surface oxygen coverages (Ɵo). Calculations of the adsorption energy per O atom (Eads_min) are followed by characterizing the preferred distribution of O atoms on a partially oxidized surface. We find that individual metals exhibit different Eads_min(Ɵo) dependencies and thermodynamical preferences: (i) decreasing Eads_min(Ɵo) and heterogeneous distribution of O atoms (stoichiometric oxide + metal), (ii) increasing Eads_min(Ɵo) and homogeneous distribution of O atoms (substoichiometric oxide), (iii) concave Eads_min(Ɵo), etc. This is of crucial importance for the quantities such as secondary electron emission yield. We demonstrate use of these results by presenting static and dynamic Monte Carlo simulations of sputtering.
Czech name
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Czech description
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Classification
Type
Jimp - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
20506 - Coating and films
Result continuities
Project
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2020
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Surface and Coatings Technology
ISSN
0257-8972
e-ISSN
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Volume of the periodical
392
Issue of the periodical within the volume
25 JUN 2020
Country of publishing house
CH - SWITZERLAND
Number of pages
12
Pages from-to
„125685-1“-„125685-12“
UT code for WoS article
000528843600007
EID of the result in the Scopus database
2-s2.0-85082714432
Basic information
Result type
Jimp - Article in a specialist periodical, which is included in the Web of Science database
OECD FORD
Coating and films
Year of implementation
2020