Influence of Nitriding Temperature and Holding Time on Hardness Profiles

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F60162694%3AG43__%2F13%3A00493935" target="_blank" >RIV/60162694:G43__/13:00493935 - isvavai.cz</a>
Result on the web
<a href="http://vavtest.unob.cz/registr" target="_blank" >http://vavtest.unob.cz/registr</a>
DOI - Digital Object Identifier
—

Result language
angličtina
Original language name
Influence of Nitriding Temperature and Holding Time on Hardness Profiles
Original language description
The plasma nitriding process produces a hard near-surface thin layer of the nitrided material. The thickness of the diffused layer, produced in the course of this process, is between 0.001 and 0.6 mm. The paper presents a study of influence of the nitriding temperature and holding time of nitriding on the material hardness profiles. The one-dimensional transient diffusion model is applied to a thin nitride layer. That allows one to predict the material hardness distribution within the near-surface layeras a function of time for a modified nitrogen diffusion coefficient. The temperature dependence of the diffusion coefficient is considered in the paper. Hence, the model involves the reaction rates of nitrides formation. The solution thus obtained is compared with experimental data for a decrease of hardness as a function of depth and time, until the core hardness is reached.
Czech name
—
Czech description
—

Publication year
2013
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection
International Conference in Military Technology, Proceedings ICMT?13.
ISBN
978-80-7231-917-6
ISSN
—
e-ISSN
—
Number of pages
6
Pages from-to
1487-1492
Publisher name
University of Defence
Place of publication
Brno
Event location
Brno
Event date
Jan 1, 2013
Type of event by nationality
EUR - Evropská akce
UT code for WoS article
—

Similar results(10)