How to increase the participation of talented newcomers in NMP?

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F60456540%3A_____%2F22%3AN0000137" target="_blank" >RIV/60456540:_____/22:N0000137 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
How to increase the participation of talented newcomers in NMP?
Original language description
This report has been prepared in the frame of the H2020 FIT-4-NMP project funded by the European Commission, which aims to increase the participation of talented newcomers from underrepresented regions in nanotechnologies, advanced materials and new manufacturing processes (NMP) research in Horizon Europe compared to Horizon 2020. FIT-4-NMP project is a support action funded by Horizon 2020 to increase the participation of talented newcomers from underrepresented regions in Horizon Europe research in the fields of nanotechnologies, advanced materials and new manufacturing processes (NMP) as compared to Horizon 2020. The report builds on the results of the questionnaire survey (D4.1) on motives, barriers and measures to encourage participation in the Framework Programmes, with an emphasis on the involvement of newcomers in NMP projects. It specifically looks at good practices and experiences in the implementation of policy measures to support participation in the Horizon 2020 (H2020) programme and summarises the main areas of action that should be addressed at European, national, regional and institutional level in removing existing barriers to participation in the Horizon Europe (HE) programme.
Czech name
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Czech description
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Publication year
2022
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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