Ablation and water etching of poly(ethylene) modified by Ar plasma

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F60461373%3A22310%2F07%3A00020194" target="_blank" >RIV/60461373:22310/07:00020194 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Ablation and water etching of poly(ethylene) modified by Ar plasma
Original language description
Ablation and water etching of high density polyethylene (PE) exposed to Ar plasma for 240 s at 8.3 W power were studied. Gravimetry was used to determine the ablated and etched layer thicknesses. The surface topography and roughness were observed via AFM. The chemical composition and structure of modified surface layer were studied by FTIR, XPS, RBS, and EPR techniques. It was found that under the experimental conditions ca. 30 nm thick layer is ablated, the surface topography changes dramatically and surface roughness increases. The cleavage of macromolecular chains is proved by the presence of surface free radicals. Oxygen containing groups known to enhance surface solubility are detected. Under present laboratory conditions ca. 20 nm thick surface layer is dissolved during 24 h. After water dissolution of the surface, the roughness increases.
Czech name
Ablace a vodní leptání polyethylenu modifikovaného Ar plasmou
Czech description
Ablace a vodní leptání polyethylenu modifikovaného Ar plasmou

Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
CD - Macromolecular chemistry
OECD FORD branch
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Project
<a href="/en/project/KAN400480701" target="_blank" >KAN400480701: NANOSTRUCTURES BASED ON CARBON AND POLYMERS FOR APPLICATION IN BIOELECTRONIC AND MEDICINE</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year
2007
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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