Annealing of gold nanostructures sputtered on glass substrate
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F60461373%3A22310%2F11%3A43892498" target="_blank" >RIV/60461373:22310/11:43892498 - isvavai.cz</a>
Alternative codes found
RIV/44555601:13440/11:43878468 RIV/00216275:25310/11:39892213 RIV/49777513:23640/11:43898564
Result on the web
<a href="http://dx.doi.org/10.1007/s00339-010-6167-1" target="_blank" >http://dx.doi.org/10.1007/s00339-010-6167-1</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1007/s00339-010-6167-1" target="_blank" >10.1007/s00339-010-6167-1</a>
Alternative languages
Result language
angličtina
Original language name
Annealing of gold nanostructures sputtered on glass substrate
Original language description
The effects of annealing at 300 A degrees C on gold nanostructures sputtered onto glass substrate were studied using XRD, SAXSees, the Van der Pauw method and ellipsometry. As-sputtered and annealed samples exhibit a different dependence of the gold lattice parameter on the sputtering time. With increasing sputtering time the average thickness of the layer and the size of gold crystallites increased. Another rapid enlargement of the crystallites is observed after annealing. The volume resistivity decreases rapidly with the increasing sputtering time for both, as-deposited and annealed structures. With increasing sputtering time initially discontinuous gold coverage changes gradually in a continuous one. Electrically continuous gold coverage on the as-sputtered and annealed samples exhibits the same concentration of free charge carriers and Hall mobility. Optical constants of as-deposited and annealed gold films determined by ellipsometry support resistivity measurements and clearly man
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
CD - Macromolecular chemistry
OECD FORD branch
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Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2011
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Applied Physics A-Materials Science & Processing
ISSN
0947-8396
e-ISSN
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Volume of the periodical
102
Issue of the periodical within the volume
3
Country of publishing house
US - UNITED STATES
Number of pages
6
Pages from-to
605-610
UT code for WoS article
000287320600015
EID of the result in the Scopus database
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