Photo-electrochemical properties of WO3 and alpha-Fe2O3 thin films
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F60461373%3A22310%2F14%3A43898482" target="_blank" >RIV/60461373:22310/14:43898482 - isvavai.cz</a>
Result on the web
<a href="http://www.aidic.it/cet/14/41/064.pdf" target="_blank" >http://www.aidic.it/cet/14/41/064.pdf</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.3303/CET1441064" target="_blank" >10.3303/CET1441064</a>
Alternative languages
Result language
angličtina
Original language name
Photo-electrochemical properties of WO3 and alpha-Fe2O3 thin films
Original language description
Iron oxide (alpha-Fe2O3) in hematite crystalline structure and tungsten trioxide have recently attracted much attention as possibly convenient materials to be used for hydrogen production via photoelectrochemical water splitting. Thius is due to their favorable properties such as band gaps between 2.0 - 2.2 eV (alpha-Fe2O3) and 2.5-2.8 eV (WO3) which allows absorbing of a substantial fraction of solar spectrum. FTO glass substrates were used for both types of films. Tungsten trioxide films were preparedby sedimentation of WO3 particles and further annealing at different temperatures to improve adhesion. Iron oxide (alpha-Fe2O3) hematite films were prepared by advanced pulsed plasma deposition method of High Power Impulse Magnetron Sputtering (HiPIMS).The films were evaluated on the basis of physical properties such as crystalline structure, surface topography and electrical behavior. The functional properties were investigated under simulated photoelectrochemical (PEC) water splittin
Czech name
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Czech description
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Classification
Type
D - Article in proceedings
CEP classification
CG - Electrochemistry
OECD FORD branch
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Result continuities
Project
<a href="/en/project/GAP108%2F12%2F2104" target="_blank" >GAP108/12/2104: Advanced semiconductor materials for photoelectrochemical water splitting</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2014
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Article name in the collection
Chemical Engineering Transactions
ISBN
978-88-95608-32-7
ISSN
2283-9216
e-ISSN
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Number of pages
6
Pages from-to
379-384
Publisher name
AIDIC Servizi
Place of publication
Milano
Event location
Chia
Event date
Sep 28, 2014
Type of event by nationality
WRD - Celosvětová akce
UT code for WoS article
000346539800064