Comparison of SIMS and RBS for depth profiling of silica glasses implanted with metal ions

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F60461373%3A22310%2F16%3A43902119" target="_blank" >RIV/60461373:22310/16:43902119 - isvavai.cz</a>
Alternative codes found
RIV/67985882:_____/16:00464368 RIV/61389005:_____/16:00464368 RIV/26722445:_____/16:N0000028
Result on the web
<a href="http://dx.doi.org/10.1116/1.4944525" target="_blank" >http://dx.doi.org/10.1116/1.4944525</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1116/1.4944525" target="_blank" >10.1116/1.4944525</a>

Result language
angličtina
Original language name
Comparison of SIMS and RBS for depth profiling of silica glasses implanted with metal ions
Original language description
Ion implantation of metal ions, followed by annealing, can be used for the formation of buried layers of metal nanoparticles in glasses. Thus, photonic structures with nonlinear optical properties can be formed. In this study, three samples of silica glasses were implanted with Cu+, Ag+, or Au+ ions under the same conditions (energy 330 keV and fluence 1 x 10(16) ions/cm(2)), and compared to three identical silica glass samples that were subsequently coimplanted with oxygen at the same depth. All the implanted glasses were annealed at 600 degrees C for 1 h, which leads to the formation of metal nanoparticles. The depth profiles of Cu, Ag, and Au were measured by Rutherford backscattering and by secondary ion mass spectrometry and the results are compared and discussed. (C) 2016 American Vacuum Society.
Czech name
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Czech description
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Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BG - Nuclear, atomic and molecular physics, accelerators
OECD FORD branch
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Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year
2016
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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