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Efficient nanostructure construction on polymer substrates by plasma treatment for tissue engineering

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F60461373%3A22310%2F16%3A43902571" target="_blank" >RIV/60461373:22310/16:43902571 - isvavai.cz</a>

  • Result on the web

  • DOI - Digital Object Identifier

Alternative languages

  • Result language

    angličtina

  • Original language name

    Efficient nanostructure construction on polymer substrates by plasma treatment for tissue engineering

  • Original language description

    Nanostructured polymers assume an important role in many applications, especially if they are prepared by an economical and effective process. The aim of this work is the construction and characterization of new surface structures induced by an inexpensive and easy method with a potential application in tissue engineering. Diverse surface structures and patterns on several polymer substrates were created by oxygen and argon plasma modification, while maintaining the identical properties of the bulk. The study was conducted on the foils of the following polymers: polyetheretherketone (PEEK), polyethersulfone (PES), polyhydroxybutyrate (PHB) and polymethylpentene (PMP). The shape and size of created structures are related to the choice of the treated polymer, applied plasma power, time exposure, and working atmosphere. The AFM and FIB-SEM images declare that the most interesting surface patterns were created on PMP and PHB by the longest time exposure (240 s). Goniometric measurement was also included and discussed.

  • Czech name

  • Czech description

Classification

  • Type

    D - Article in proceedings

  • CEP classification

    JJ - Other materials

  • OECD FORD branch

Result continuities

  • Project

    Result was created during the realization of more than one project. More information in the Projects tab.

  • Continuities

    P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Others

  • Publication year

    2016

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Article name in the collection

    2016 IEEE 16TH INTERNATIONAL CONFERENCE ON NANOTECHNOLOGY (IEEE-NANO)

  • ISBN

    978-1-5090-1493-4

  • ISSN

  • e-ISSN

  • Number of pages

    4

  • Pages from-to

    149-152

  • Publisher name

    IEEE

  • Place of publication

    New York

  • Event location

    Sendai

  • Event date

    Aug 22, 2016

  • Type of event by nationality

    WRD - Celosvětová akce

  • UT code for WoS article

    000391840000043