Patterning of polymer by excimer laser for osteoblasts growth enhancement
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F60461373%3A22310%2F16%3A43903761" target="_blank" >RIV/60461373:22310/16:43903761 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Patterning of polymer by excimer laser for osteoblasts growth enhancement
Original language description
We described ripple and dot patterning of three different aromatic polymer substrates by KrF excimer laser treatment. The conditions for regular structures were established due to laser fluence and number of pulses and subsequently was investigated the influence of the angle of incidence of the laser beam. We have chosen polyethersulphone (PES), polyetherimide (PEI) and polyetheretherketone (PEEK) as substrates for modification, which are thermally, chemically and mechanically resistant aromatic polymers with high absorption coefficient at excimer laser wavelength. Nanostructured polymers with these properties have great application potential in tissue engineering.
Czech name
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Czech description
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Classification
Type
O - Miscellaneous
CEP classification
JJ - Other materials
OECD FORD branch
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Result continuities
Project
<a href="/en/project/NV15-32497A" target="_blank" >NV15-32497A: Bioactive nanostructured surfaces for histocompatible implants</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2016
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů