Protection of hematite photoelectrodes by ALD-TiO2 capping

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F60461373%3A22310%2F21%3A43923715" target="_blank" >RIV/60461373:22310/21:43923715 - isvavai.cz</a>

Alternative codes found

RIV/61388955:_____/21:00539266 RIV/60461373:22350/21:43923715 RIV/00216275:25310/21:39918170 RIV/00216305:26620/21:PU140746

Result on the web

<a href="https://www.sciencedirect.com/science/article/pii/S1010603020309230" target="_blank" >https://www.sciencedirect.com/science/article/pii/S1010603020309230</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.jphotochem.2020.113126" target="_blank" >10.1016/j.jphotochem.2020.113126</a>

Result language

angličtina

Original language name

Protection of hematite photoelectrodes by ALD-TiO2 capping

Original language description

Iron (III) oxide, in the form of hematite (α-Fe2O3), is a n-type semiconductor which is photoactive in the visible spectral region. Therefore, use in photoelectrocatalysis and photoassisted water electrolysis may be suggested. For such implementations, stability of contacts with liquid phases is mandatory. Hematite is stable in alkaline media but less stable in acidic media. For the first time the coverage of porous photoactive Sn doped hematite by thin capping layers of TiO2, deposited by Atomic Layer Deposition (ALD) and its impact on photocurrent and chemical stability of hematite is shown. The nominal thicknesses of the TiO2 ALD coatings were 0.5, 2 and 7.5 nm. The presence of the TiO2 coatings was evidenced by X-ray photoelectron spectroscopy, high-resolution transmission electron microscopy (HR-TEM) and scanning TEM coupled with energy dispersive X-ray (EDX) spectroscopy. HR-TEM analyses revealed that the TiO2 capping layers were amorphous and conformal. Exposure of uncovered hematite layers to 1 M sulfuric acid led to a nominal dissolution rate of 0.23 nm/h which was halved when a TiO2 ALD coating (7.5 nm thin) was applied. Due to mismatch of the valence band positions of the two semiconductors, photocurrents were strongly diminished as the capping layer thickness was increased. Post-calcination of as deposited ALD films on hematite resulted in an increase of photocurrent, which only exceeded photocurrents of pristine hematite when the ALD thickness was not more than 0.5 nm. © 2021 Elsevier B.V.

Czech name

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Czech description

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Type

J_imp - Article in a specialist periodical, which is included in the Web of Science database

CEP classification

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OECD FORD branch

10402 - Inorganic and nuclear chemistry

Project

Result was created during the realization of more than one project. More information in the Projects tab.

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year

2021

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Journal of Photochemistry and Photobiology A: Chemistry

ISSN

1010-6030

e-ISSN

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Volume of the periodical

409

Issue of the periodical within the volume

1

Country of publishing house

US - UNITED STATES

Number of pages

7

Pages from-to

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UT code for WoS article

000623634700001

EID of the result in the Scopus database

2-s2.0-85099693410