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Thin Nickel Oxide Layers Prepared by Reactive Ion Beam Sputtering: Fabrication and the Study of Electrophysical Parameters

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F60461373%3A22340%2F12%3A43893929" target="_blank" >RIV/60461373:22340/12:43893929 - isvavai.cz</a>

  • Result on the web

  • DOI - Digital Object Identifier

Alternative languages

  • Result language

    angličtina

  • Original language name

    Thin Nickel Oxide Layers Prepared by Reactive Ion Beam Sputtering: Fabrication and the Study of Electrophysical Parameters

  • Original language description

    Thin nickel oxide layers (thickness ca 50 and 100 nm) for sensorics were fabricated by ion beam sputtering method with subsequent annealing. Ion beam formed from a mixture of argon and oxygen was used to sputter the nickel foil. Different volume ratios of argon:oxygen in mixture were used, ranging from 1:0 to 1:4. Deposited layers were characterized in as-deposited state and after annealing at temperature of 400°C. The study of electrophysical properties (sheet resistance, mobility and concentration ofcharge carriers) was performed by four point Van der Pauw technique and Hall measurements respectively. Hall measurements revealed majority charge carriers to be electrons. For as-deposited layers electron surface concentration decreases with increasingamount of oxygen in ion beam and is in range (5 - 23) x 10^20 m^-2 for above mentioned range of argon:oxygen ratios. According to this trend the sheet resistance of the layers increases with higher amount of oxygen in ion beam in the inte

  • Czech name

  • Czech description

Classification

  • Type

    D - Article in proceedings

  • CEP classification

    BM - Solid-state physics and magnetism

  • OECD FORD branch

Result continuities

  • Project

  • Continuities

    S - Specificky vyzkum na vysokych skolach

Others

  • Publication year

    2012

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Article name in the collection

    NANOCON 2012 Conference Proceedings 4th International conference

  • ISBN

    978-80-87294-32-1

  • ISSN

  • e-ISSN

  • Number of pages

    6

  • Pages from-to

    1-6

  • Publisher name

    TANGER

  • Place of publication

    Ostrava

  • Event location

    Brno

  • Event date

    Oct 23, 2012

  • Type of event by nationality

    WRD - Celosvětová akce

  • UT code for WoS article