Electron attachment to hexafluoropropylene oxide (HFPO)
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61388955%3A_____%2F18%3A00497402" target="_blank" >RIV/61388955:_____/18:00497402 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.1063/1.5051724" target="_blank" >http://dx.doi.org/10.1063/1.5051724</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1063/1.5051724" target="_blank" >10.1063/1.5051724</a>
Alternative languages
Result language
angličtina
Original language name
Electron attachment to hexafluoropropylene oxide (HFPO)
Original language description
We probe the electron attachment in hexafluoropropylene oxide (HFPO), C3F6O, a gas widely used in plasma technologies. We determine the absolute electron attachment cross section using two completely different experimental approaches: (i) a crossed-beam experiment at single collision conditions (local pressures of 5 × 10−4 mbar) and (ii) a pulsed Townsend experiment at pressures of 20–100 mbar. In the latter method, the cross sections are unfolded from the electron attachment rate coefficients. The cross sections derived independently by the two methods are in very good agreement. We additionally discuss the dissociative electron attachment fragmentation patterns and their role in the radical production in industrial HFPO plasmas.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
10403 - Physical chemistry
Result continuities
Project
<a href="/en/project/GA17-04844S" target="_blank" >GA17-04844S: Cross sections and dynamics of electron scattering on molecular systems</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2018
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Journal of Chemical Physics
ISSN
0021-9606
e-ISSN
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Volume of the periodical
149
Issue of the periodical within the volume
20
Country of publishing house
US - UNITED STATES
Number of pages
7
Pages from-to
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UT code for WoS article
000451745000020
EID of the result in the Scopus database
2-s2.0-85057524413