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Interaction of 4-nitrothiophenol with low energy electrons: Implications for plasmon mediated reactions

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61388955%3A_____%2F20%3A00533837" target="_blank" >RIV/61388955:_____/20:00533837 - isvavai.cz</a>

  • Result on the web

    <a href="http://hdl.handle.net/11104/0312092" target="_blank" >http://hdl.handle.net/11104/0312092</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.1063/5.0018784" target="_blank" >10.1063/5.0018784</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    Interaction of 4-nitrothiophenol with low energy electrons: Implications for plasmon mediated reactions

  • Original language description

    The reduction of 4-nitrothiophenol (NTP) to 4-4 'dimercaptoazobenzene (DMAB) on laser illuminated noble metal nanoparticles is one of the most widely studied plasmon mediated reactions. The reaction is most likely triggered by a transfer of low energy electrons from the nanoparticle to the adsorbed molecules. Besides the formation of DMAB, dissociative side reactions of NTP have also been observed. Here, we present a crossed electron-molecular beam study of free electron attachment to isolated NTP in the gas-phase. Negative ion yields are recorded as a function of the electron energy, which helps to assess the accessibility of single electron reduction pathways after photon induced electron transfer from nanoparticles. The dominant process observed with isolated NTP is associative electron attachment leading to the formation of the parent anion of NTP. Dissociative electron attachment pathways could be revealed with much lower intensities, leading mainly to the loss of functional groups. The energy gained by one electron reduction of NTP may also enhance the desorption of NTP from nanoparticles. Our supporting experiments with small clusters, then, show that further reaction steps are necessary after electron attachment to produce DMAB on the surfaces.

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database

  • CEP classification

  • OECD FORD branch

    10403 - Physical chemistry

Result continuities

  • Project

    <a href="/en/project/GA19-01159S" target="_blank" >GA19-01159S: Electron Attachment in Radiation Chemistry</a><br>

  • Continuities

    I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Others

  • Publication year

    2020

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Journal of Chemical Physics

  • ISSN

    0021-9606

  • e-ISSN

  • Volume of the periodical

    153

  • Issue of the periodical within the volume

    10

  • Country of publishing house

    US - UNITED STATES

  • Number of pages

    7

  • Pages from-to

    104303

  • UT code for WoS article

    000571926900001

  • EID of the result in the Scopus database

    2-s2.0-85091055059