Interaction of 4-nitrothiophenol with low energy electrons: Implications for plasmon mediated reactions
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61388955%3A_____%2F20%3A00533837" target="_blank" >RIV/61388955:_____/20:00533837 - isvavai.cz</a>
Result on the web
<a href="http://hdl.handle.net/11104/0312092" target="_blank" >http://hdl.handle.net/11104/0312092</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1063/5.0018784" target="_blank" >10.1063/5.0018784</a>
Alternative languages
Result language
angličtina
Original language name
Interaction of 4-nitrothiophenol with low energy electrons: Implications for plasmon mediated reactions
Original language description
The reduction of 4-nitrothiophenol (NTP) to 4-4 'dimercaptoazobenzene (DMAB) on laser illuminated noble metal nanoparticles is one of the most widely studied plasmon mediated reactions. The reaction is most likely triggered by a transfer of low energy electrons from the nanoparticle to the adsorbed molecules. Besides the formation of DMAB, dissociative side reactions of NTP have also been observed. Here, we present a crossed electron-molecular beam study of free electron attachment to isolated NTP in the gas-phase. Negative ion yields are recorded as a function of the electron energy, which helps to assess the accessibility of single electron reduction pathways after photon induced electron transfer from nanoparticles. The dominant process observed with isolated NTP is associative electron attachment leading to the formation of the parent anion of NTP. Dissociative electron attachment pathways could be revealed with much lower intensities, leading mainly to the loss of functional groups. The energy gained by one electron reduction of NTP may also enhance the desorption of NTP from nanoparticles. Our supporting experiments with small clusters, then, show that further reaction steps are necessary after electron attachment to produce DMAB on the surfaces.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
10403 - Physical chemistry
Result continuities
Project
<a href="/en/project/GA19-01159S" target="_blank" >GA19-01159S: Electron Attachment in Radiation Chemistry</a><br>
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2020
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Journal of Chemical Physics
ISSN
0021-9606
e-ISSN
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Volume of the periodical
153
Issue of the periodical within the volume
10
Country of publishing house
US - UNITED STATES
Number of pages
7
Pages from-to
104303
UT code for WoS article
000571926900001
EID of the result in the Scopus database
2-s2.0-85091055059