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Photoinduced Resist-free Imprinting (PRI) in fullerene thin films as revealed by Grazing Incidence Small-angle X-ray scattering

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61388955%3A_____%2F21%3A00541681" target="_blank" >RIV/61388955:_____/21:00541681 - isvavai.cz</a>

  • Result on the web

    <a href="http://hdl.handle.net/11104/0319212" target="_blank" >http://hdl.handle.net/11104/0319212</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.1016/j.apsusc.2021.149254" target="_blank" >10.1016/j.apsusc.2021.149254</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    Photoinduced Resist-free Imprinting (PRI) in fullerene thin films as revealed by Grazing Incidence Small-angle X-ray scattering

  • Original language description

    In this article we explore the potential of synchrotron Grazing Incidence Small Angle X-ray Scattering (GISAXS) to evaluate the extension of a Photoinduced Resist-free Imprinting (PRI) effect for grating-like Laser Induced Periodic Surface Structures (LIPSS) on spin-coated thin films of the fullerene derivative [6,6]-phenyl C-71-butyric acid methyl ester (PC71BM). Valuable information about the nature of both the original fullerene LIPSS and of the remaining resist-free nanostructure in terms of geometry, size distribution, lattice periodicity and degree of order can be achieved by simulations of the GISAXS patterns. One of the most interesting features provided by the GISAXS analysis is the estimation of the paracrystalline distortion factor, which can be useful to evaluate the level of order in the nanostructure. Data revealed that LIPSS in PC71BM films can be described as onedimensional paracrystalline lattices with levels of order in accordance with those typically observed in LIPSS of other materials. The PRI effect leaves a qualitatively similar nanostructure but about two times more disordered than the original LIPSS one. Our results show that GISAXS is a powerful tool to characterize Resist-free Imprinting procedures of potential relevance in nanotechnology.

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database

  • CEP classification

  • OECD FORD branch

    10403 - Physical chemistry

Result continuities

  • Project

  • Continuities

    I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Others

  • Publication year

    2021

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Applied Surface Science

  • ISSN

    0169-4332

  • e-ISSN

    1873-5584

  • Volume of the periodical

    548

  • Issue of the periodical within the volume

    MAY 2021

  • Country of publishing house

    NL - THE KINGDOM OF THE NETHERLANDS

  • Number of pages

    9

  • Pages from-to

    149254

  • UT code for WoS article

    000624474700005

  • EID of the result in the Scopus database

    2-s2.0-85101331505