Photocatalytic Degradation Rate of Oxalic Acid on the Semiconductive Layer of n-TiO 2 Particles in the Batch Mode Plate Reactor. Part I: Mass Transfer Limits.

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61388955%3A_____%2F98%3A54990157" target="_blank" >RIV/61388955:_____/98:54990157 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Photocatalytic Degradation Rate of Oxalic Acid on the Semiconductive Layer of n-TiO 2 Particles in the Batch Mode Plate Reactor. Part I: Mass Transfer Limits.
Original language description
Original scientific paper dealing with Photocatalytic Degradation Rate of Oxalic Acid on the Semiconductive Layer of n-TiO 2 Particles in the Batch Mode Plate Reactor. Part I: Mass Transfer Limits.
Czech name
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Czech description
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Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
CF - Physical chemistry and theoretical chemistry
OECD FORD branch
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Project
<a href="/en/project/GA203%2F96%2F0883" target="_blank" >GA203/96/0883: Chem.-eng. optimization of electrochem. photovoltaic reactor with n-TiO2 particles for deactivation of microbiol. contaminants in drinking and waste water</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year
1998
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Result description