UV-Laser-Induced Photolysis of Trimethyl(vinyloxy)silane for Chemical Vapour Deposition of Polysiloxane Films.
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61388955%3A_____%2F99%3A54990111" target="_blank" >RIV/61388955:_____/99:54990111 - isvavai.cz</a>
Alternative codes found
RIV/67985858:_____/99:54990111
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
UV-Laser-Induced Photolysis of Trimethyl(vinyloxy)silane for Chemical Vapour Deposition of Polysiloxane Films.
Original language description
Original scientific paper dealing with UV-Laser-Induced Photolysis of Trimethyl(vinyloxy)silane for Chemical Vapour Deposition of Polysiloxane Films.
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
CF - Physical chemistry and theoretical chemistry
OECD FORD branch
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Result continuities
Project
<a href="/en/project/GA203%2F96%2F1217" target="_blank" >GA203/96/1217: IR laser induced chemical vapour deposition of Si2O and Si2O :H films.Studies on preparation and properties of novel semiconductor materials.</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
1999
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Applied Organometallic Chemistry
ISSN
0268-2605
e-ISSN
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Volume of the periodical
13
Issue of the periodical within the volume
N/A
Country of publishing house
GB - UNITED KINGDOM
Number of pages
5
Pages from-to
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UT code for WoS article
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EID of the result in the Scopus database
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