Study of Cu+, Ag+ and Au+ ion implantation into silicate glasses

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61389005%3A_____%2F10%3A00351912" target="_blank" >RIV/61389005:_____/10:00351912 - isvavai.cz</a>
Alternative codes found
RIV/60461373:22310/10:00022985 RIV/44555601:13440/10:00005564
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Study of Cu+, Ag+ and Au+ ion implantation into silicate glasses
Original language description
A study of the ion implantation of Cu+, Ag+ or Au+ ions into different types of silicate glasses is reported. The energy of the implanted ions was 330 keV and the implantation fluence was kept at 11016 cm-2. The samples were characterised by various analytical methods: Rutherford Backscattering Spectrometry for the concentration depth profiles of the implanted atoms, Raman spectroscopy for the structure of the samples and also by UV-VIS absorption spectroscopy. The obtained data were evaluated on the bases of the structure of the glass matrix and the relations between the structural changes and optical properties, important for photonics applications, were formulated. The main focus was the impact of various types and concentrations of glass network modifiers (e.g. Li, Na, K, Mg, Ca or Zn) as well as glass network formers (Si, B) on the projected range of the implanted ions.
Czech name
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Czech description
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Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BG - Nuclear, atomic and molecular physics, accelerators
OECD FORD branch
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Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year
2010
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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